Evaluation of a MEMS-Based Dual Metal-Layer Thin-Film Microelectrode Array for Suprachoroidal Electrical Stimulation

Evaluation of a MEMS-Based Dual Metal-Layer Thin-Film Microelectrode Array for Suprachoroidal Electrical Stimulation 150 150 Transactions on Neural Systems and Rehabilitation Engineering (TNSRE)

Xiaohong Sui, Jingjing Sun, Liming Li, Chuanqing Zhou, Xuejiao Luo, Niansheng Xia, Yan Yan, Yao Chen, Qiushi Ren, and Xinyu Chai
Evaluation of a MEMS-Based Dual Metal-Layer Thin-Film Microelectrode Array for Suprachoroidal Electrical Stimulation

Abstract

A double metal-layer thin-film platinum microelectrode array was fabricated for implantation between sclera and choroid based on MEMS processing techniques and photosensitive polyimide material. The array was composed of 60 stimulating sites (6 x 10) and four selectable returning electrodes. The diameter of each stimulating electrode was 350 µm with a center-to-center spacing of 750 µm. The transient voltage responses of the electrode to current pulse stimulation indicated a charge-injection capacity greater than 52.1 µC/cm². Acute in vivo animal experiments showed that the implicit time of electrically evoked potentials (EEPs) was 17.09 ± 1.45 ms at a threshold current of 25.55 ± 5.43 µA for a full-row of simultaneously stimulated electrodes (i.e., current applied simultaneously to each of the 10 electrodes). Individual electrode stimulation threshold was 48.57 ± 6.90 µA. The corresponding threshold charge densities were 13.28 ± 2.82 µC/cm² and 25.24 ± 3.59 µC/cm², respectively. The spatial spread of the maximally recorded P1 response in the EEPs indicated a correspondence between the retinal stimulation site and the focal response location in the cortex. This method of array fabrication is suitable for acute suprachoroidal stimulation, and has a potential use for the fabrication of a visual prosthesis.